Purchase of maskless laser lithography system
Details
| Contract Title: | Purchase of maskless laser lithography system |
| Published Date: | Jan 30, 2026 |
| Notice Type: | Notice (PriorInformationNotice) |
| Value Banding: | High Value |
| Delivery Point: | United Kingdom |
Description:
The Institute for Compound Semiconductors (ICS) intends to procure a maskless laser lithography system to support essential expansion of its hybrid electro‑optical lithography capability. The system will enable processing in which wafers are exposed using both electron‑beam lithography and optical radiation within the same resist layer(s), or across multiple aligned resist layers. ICS has previously invested €2.5 M in a state‑of‑the‑art electron beam lithography platform capable of patterning na...